図書

Photomask and next-generation lithography mask technology 18 : 13-15 April 2011 : Yokohama, Japan : Apr 2011, Yokohama, Japan. (SPIE Proceedings ; 8081)

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Photomask and next-generation lithography mask technology 18 : 13-15 April 2011 : Yokohama, Japan : Apr 2011, Yokohama, Japan.

(SPIE Proceedings ; 8081)

Call No. (NDL)
M17-12-1047
Bibliographic ID of National Diet Library
000011287971
Material type
図書
Author
Konishi, Toshio.
Publisher
SPIE
Publication date
c2011.
Material Format
Paper
Capacity, size, etc.
1 v. (various pagings) ; 28 cm.
NDC
-
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Notes on use

Note (General):

Papers."This conference was canceled due to the earthquake off the northeast coast of Japan in March 2011. This volume includes some of the papers tha...

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ill. (some col.)

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Paper

Material Type
図書
ISBN
9780819486738
ISSN (series)
0277786X
Author Heading
Publication, Distribution, etc.
Publication Date
c2011.
Publication Date (W3CDTF)
2011