Photomask technology 2011 : 19-22 September 2011 : Monterey, California, United States : SPIE conference on photomask technology 2011 : 31st international symposium on photomask technology : Sep 2011, Monterey, CA.

• Material Type: 図書
• ISBN (set): 9780819487919 (pbk. : set)
• ISSN (series): 0277786X
• Title: Photomask technology 2011 : 19-22 September 2011 : Monterey, California, United States : SPIE conference on photomask technology 2011 : 31st international symposium on photomask technology : Sep 2011, Monterey, CA.
• Series Title: SPIE Proceedings ; 8166
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 8166. 0277-786X
• Author Heading: Maurer, Wilhelm.; Abboud, Frank E.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2011.
• Publication Date (W3CDTF): 2011
• Extent: 2 parts
• Other physical details: ill. (some col.)
• Size: 28 cm.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Integrated circuits--Masks--Congresses.; Masks (Electronics)--Congresses.; Microlithography--Congresses.; Photomask technology; SPIE
• LCC: QC371
• DDC: 621.3815/31
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-12-2555
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 023449624; http://id.ndl.go.jp/bib/023449624
• LC Control Number: 2012359726; https://lccn.loc.gov/2012359726
• OCLC No.: 775026088; https://www.worldcat.org/oclc/775026088
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215