Advances in resist materials and processing technology 29 : 13-15 February 2012 : San Jose, California, United States.

• Material Type: 図書
• ISBN: 9780819489814
• ISSN (series): 0277786X
• Title: Advances in resist materials and processing technology 29 : 13-15 February 2012 : San Jose, California, United States.
• Series Title: SPIE Proceedings ; 8325
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 8325. 0277-786X
• Author Heading: Somervell, Mark Howell, 1973-; Wallow, Thomas Ingolf.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2012.
• Publication Date (W3CDTF): 2012
• Extent: 1 v. (various pagings)
• Other physical details: ill.
• Size: 28 cm.
• Additional Title: SPIE advanced lithography.; Feb 2012, San Jose, CA.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Genre/Form Terms: Electronic books.
• Subject Heading: Photoresists--Congresses.; Microlithography--Congresses.
• LCC: TK7874
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Source: http://link.spie.org/PSISDG/8325/1
• Holding library: 国立国会図書館
• Call No.: M17-12-4062
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 023762502; http://id.ndl.go.jp/bib/023762502
• OCLC No.: 794060535; https://www.worldcat.org/oclc/794060535
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215