Advanced etch technology for nanopatterning : 13-14 February 2012 : San Jose, California, United States.

• Material Type: 図書
• ISBN: 9780819489845 (pbk.)
• ISSN (series): 0277786X
• Title: Advanced etch technology for nanopatterning : 13-14 February 2012 : San Jose, California, United States.
• Series Title: SPIE Proceedings ; 8328
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 8328. 0277-786X
• Author Heading: Zhang, Ying.; Oehrlein, G. S.; Lin, Qinghuang, 1963-
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2012.
• Publication Date (W3CDTF): 2012
• Extent: 1 v. (various pagings)
• Other physical details: ill. (some col.)
• Size: 28 cm.
• Additional Title: SPIE advanced lithography.; advanced etch technology for nanoatterning [i.e. nanopatterning] conference : SPIE advanced lithography symposium : 1st AETNC : Feb 2012, San Jose, CA.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Plasma etching--Congresses.; Lithography--Congresses.; Advanced etch technology; Nanopatterning
• LCC: TA2020; QC371
• NDLC: M17
• Target Audience: 一般
• Note (General): Selected papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-12-3838
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 023768925; http://id.ndl.go.jp/bib/023768925
• LC Control Number: 2012471867; https://lccn.loc.gov/2012471867
• OCLC No.: 797974369; https://www.worldcat.org/oclc/797974369
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215