Atomic layer deposition : principles, characteristics, and nanotechnology applications

• Material Type: 図書
• ISBN: 9781118062777 (cloth : alk. paper); 1118062779 (cloth : alk. paper)
• Title: Atomic layer deposition : principles, characteristics, and nanotechnology applications
• Author/Editor: Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.
• Edition: 2nd Edition.
• Author Heading: Kääriäinen, Tommi.; Cameron, David, 1949-; Kääriäinen, Marja-Leena.; Sherman, Arthur, 1931-
• Publication, Distribution, etc.: Salem, Massachusetts : Scrivener Publishing; Hoboken, New Jersey : John Wiley & Sons, Inc.
• Publication Date: [2013]
• Publication Date (W3CDTF): 2013
• Extent: xv, 253 pages
• Other physical details: illustrations
• Size: 25 cm
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Chemical vapor deposition.; Epitaxy.; Microelectronics.; Nanotechnology.
• LCC: TS695
• DDC: 620/.5
• NDLC: PA151
• Target Audience: 一般
• Note (Bibliography): Includes bibliographical references and index.
• Holding library: 国立国会図書館
• Call No.: PA151-B51
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 023948615; http://id.ndl.go.jp/bib/023948615
• LC Control Number: 2013016209; https://lccn.loc.gov/2013016209
• OCLC No.: 841199208; https://www.worldcat.org/oclc/841199208
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 211