Photomask technology 2013 : 10-12 September 2013 : Monterey, California, United States.

• Material Type: 図書
• ISBN: 9780819495457 (paperback)
• ISSN (series): 0277786X
• Title: Photomask technology 2013 : 10-12 September 2013 : Monterey, California, United States.
• Series Title: SPIE Proceedings ; 8880
• Author Heading: Faure, Thomas B.; Ackmann, Paul W.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2013.
• Publication Date (W3CDTF): 2013
• Extent: 1 v. (various pagings)
• Other physical details: ill.
• Size: 28 cm.
• Additional Title: SPIE conference on photomask technology 2013 : 33rd international symposium on photomask technology : Sep 2013, Monterey, CA.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Integrated circuits--Masks--Congresses.; Masks (Electronics)--Congresses.; Microlithography--Congresses.; Photomask technology
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-14-1683
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 025153412; http://id.ndl.go.jp/bib/025153412
• OCLC No.: 870645709; https://www.worldcat.org/oclc/870645709
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215