Advanced etch technology for nanopatterning III : 24-25 February 2014 : San Jose, California, United States : conference advanced etch technology for nanopatterning 3 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA.

• Material Type: 図書
• ISBN: 9780819499776 (paperback); 0819499773 (paperback)
• ISSN (series): 0277-786X
• Title: Advanced etch technology for nanopatterning III : 24-25 February 2014 : San Jose, California, United States : conference advanced etch technology for nanopatterning 3 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA.
• Series Title: SPIE Proceedings ; 9054
• Author Heading: Oehrlein, Gottlieb S.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2014]
• Publication Date (W3CDTF): 2014
• Extent: 1 volume (various pagings)
• Other physical details: illustrations (black and white)
• Size: 28 cm.
• Alternative Title: Advanced etch technology for nanopatterning 3 : 24-25 February 2014 : San Jose, California, United States; SPIE advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Plasma etching--Congresses.; Semiconductors--Etching--Congresses.; Nanoelectronics--Congresses.; Advanced etch technology; Etch technology; Nanopatterning
• NDLC: M17
• Target Audience: 一般
• Note (General): Selected papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-14-2844
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 025507780; http://id.ndl.go.jp/bib/025507780
• OCLC No.: 887920095; https://www.worldcat.org/oclc/887920095
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215