Optical microlithography XXVII : 25-27 February 2014 : San Jose, California, United States : 27th optical microlithography conference : OM 27 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA.

• Material Type: 図書
• ISBN: 9780819499752
• ISSN (series): 0277-786X
• Title: Optical microlithography XXVII : 25-27 February 2014 : San Jose, California, United States : 27th optical microlithography conference : OM 27 : SPIE advanced lithography symposium 2014 : Feb 2014, San Jose, CA.
• Series Title: SPIE Proceedings ; 9052
• Author Heading: Lai, Kafai.; Erdmann, Andreas.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2014]
• Publication Date (W3CDTF): 2014
• Extent: 1 volume (various pagings)
• Other physical details: illustrations (black and white)
• Size: 28 cm.
• Alternative Title: Optical microlithography 27 : 25-27 February 2014 : San Jose, California, United States; SPIE advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: txt : text
• Media Type: n : unmediated
• Carrier Type: nc : volume
• Subject Heading: Integrated circuits--Masks--Congresses.; Microlithography--Congresses.; X-ray lithography--Congresses.; Manufacturing processes--Congresses.
• LCC: TK7835
• NDLC: M17
• Target Audience: 一般
• Note (General): Selected papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-15-135
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 025577064; http://id.ndl.go.jp/bib/025577064
• LC Control Number: 2014412914; https://lccn.loc.gov/2014412914
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215