Photomask and next-generation lithography mask technology XXI : 15-17 April 2014 : Yokohama, Japan : Apr 2014, Yokohama, Japan.

• Material Type: 図書
• ISBN: 9781628413236 (paperback); 1628413239 (paperback)
• ISSN (series): 0277-786X
• Title: Photomask and next-generation lithography mask technology XXI : 15-17 April 2014 : Yokohama, Japan : Apr 2014, Yokohama, Japan.
• Series Title: SPIE Proceedings ; 9256
• Author Heading: Kato, Kokoro.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2014]
• Publication Date (W3CDTF): 2014
• Extent: 1 volume (various pagings)
• Other physical details: illustrations (black and white)
• Size: 28 cm.
• Alternative Title: Photomask and next-generation lithography mask technology 21 : 15-17 April 2014 : Yokohama, Japan
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Masks (Electronics)--Congresses.; Integrated circuits--Masks--Congresses.; X-ray lithography--Congresses.; Microlithography--Congresses.; Optoelectronic devices--Design and construction--Congresses.; Mask technology; Photomask
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-14-3242
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 025839035; http://id.ndl.go.jp/bib/025839035
• OCLC No.: 897436057; https://www.worldcat.org/oclc/897436057
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215