International conference on extreme ultraviolet lithography 2017 : 11-14 September 2017 : Monterey, California, United States : Sep 2017, Monterey, CA.

• Material Type: 図書
• ISBN: 9781510613744 print
• ISSN (series): 0277-786X
• Title: International conference on extreme ultraviolet lithography 2017 : 11-14 September 2017 : Monterey, California, United States : Sep 2017, Monterey, CA.
• Series Title: SPIE Proceedings ; 10450
• Author Heading: International Conference on Extreme Ultraviolet Lithography (2017 : Monterey, Calif.); Gargini, Paolo A.; Naulleau, Patrick P.; Ronse, Kurt G.; Itani, Toshiro.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2017]
• Publication Date (W3CDTF): 2017
• Extent: 1 volume (various pagings)
• Size: 28 cm.
• Alternative Title: SPIE. photomask technology + EUV lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Extreme ultraviolet lithography--Congresses.; Ultraviolet radiation--Industrial applications--Congresses.
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-19-886
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 028836881; http://id.ndl.go.jp/bib/028836881
• LC Control Number: 2018418509; https://lccn.loc.gov/2018418509
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215