レジスト材料の基礎とプロセス最適化

レジスト材料の基礎とプロセス最適化 = Fundamentals of resist materials and process optimization

Call No. (NDL): YU7-R25
Bibliographic ID of National Diet Library: 033324386

Material type: 図書

Author: 河合晃著

Publisher: シーエムシー・リサーチ

Publication date: 2021.11

Material Format: Paper

Capacity, size, etc.: 193 p ; 30 cm

NDC: 578.4

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Notes on use

Accompanying material：: CD-ROM 1枚 (12 cm)

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Bibliographic Record

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Paper

Material Type: 図書
ISBN: 978-4-910581-10-1
Title: レジスト材料の基礎とプロセス最適化
Title Transcription: レジストザイリョウノキソトプロセスサイテキカ
Author/Editor: 河合晃著
Author Heading: 著者：河合, 晃カワイ, アキラ ( 01226447 )Authorities
Publication, Distribution, etc.: 東京 : シーエムシー・リサーチ (出版)
Publication Date: 2021.11
Publication Date (W3CDTF): 2021
Extent: 193 p
Size: 30 cm
Accompanying material: CD-ROM 1枚 (12 cm)
Alternative Title: Fundamentals of resist materials and process optimization Fundamentals of resist materials and process optimization
Fundamentals of resist materials and process optimization
Place of Publication (Country Code): JP
Text Language Code: jpn
Content Type: テキスト
不明
Media Type: 機器不用
コンピュータ
Carrier Type: 冊子
コンピュータ・ディスク
Subject Heading: 感光性樹脂カンコウセイジュシ ( 00576718 )Authorities
リソグラフィーリソグラフィー ( 00576369 )Authorities
NDC 10th ed.: 578.4 : Polymers. Plastics. Cellulose
NDLC: YU7
PA441
Target Audience: 一般
Note (Bibliography): 文献あり
Price: 99000円 (税込)
Holding library: 国立国会図書館
Call No.: YU7-R25
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 033324386
http://id.ndl.go.jp/bib/033324386
National Bibliography No. (JPNO): 23952147
Cataloging Rule: Nippon Cataloging Rules 2018 Edition
Bibliographic Record Category (NDL): 111