Photomask Japan 2023: XXIX symposium on photomask and next-generation lithography mask technology : 25-27 April 2023 : online only, Japan

• Material Type: 図書
• ISBN: 9781510670907
• ISSN (series): 0277-786X
• Title: Photomask Japan 2023: XXIX symposium on photomask and next-generation lithography mask technology : 25-27 April 2023 : online only, Japan
• Series Title: SPIE Proceedings ; 12915
• Author Heading: Photomask Japan (Conference) (2023 : Online); Kojima, Yosuke; Photomask Japan; SPIE (Society)
• Publication, Distribution, etc.: Bellingham, Washington : SPIE (出版)
• Publication Date: [2023]; 著作権日付 : ©2023
• Publication Date (W3CDTF): 2023
• Extent: 1 volume (various pagings)
• Size: 28 cm
• Alternative Title: Photomask Japan 2023: 29 symposium on photomask and next-generation lithography mask technology : 25-27 April 2023 : online only, Japan
• Additional Title: Apr 2023
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• LCC: TK7872.M3
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers; Held online
• Note (Bibliography): Includes bibliographical references
• Source: SPIE Digital Library; https://proceedings.spiedigitallibrary.org/volume.aspx?volume=12915
• Holding library: 国立国会図書館
• Call No.: M17-25-63
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 033684339; http://id.ndl.go.jp/bib/033684339
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215