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Deposition Mechanism and Characterization of a-C:H Films Deposited using Ar + H2 + C7H8 Plasma CVD
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国立国会図書館デジタルコレクション
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DOI[10.15017/1654913]to the data of the same series
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2018-10-04 再収集
2018-10-04 再収集
2018-10-04 再収集
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2023-09-05 再収集
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- Material Type
- 博士論文
- Title
- Author/Editor
- 董, ?
- Author Heading
- Publication Date
- 2016-03-25
- Publication Date (W3CDTF)
- 2016-03-25
- Alternative Title
- Ar + H2 + C7H8プラズマCVDで形成したa-C:H薄膜の成長機構と特性評価
- Contributor
- 白谷 正治岡田 龍雄古閑 一憲
- Degree grantor/type
- 九州大学
- Date Granted
- 2016-03-25