Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography : Lithography Technology

• Material Type: 記事
• Title: Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography : Lithography Technology
• Author/Editor: LOCHEL,B.; CHLEBEK,J.; GRIMM,J.; HUBER,H.-L.; MACIOBEK,A.
• Publication, Distribution, etc.: 日本 : Japanese Journal of Applied Physics
• Publication Date: 1991-01-31
• Publication Date (W3CDTF): 1991-01-31
• Periodical title: JJAP series
• No. or year of volume/issue: 4
• Volume: 4
• Pages: 73-77
• Text Language Code: ENG
• Subject Heading: silicon membrane; mask blanks; X-ray lithography; ion projection; anodec bonding; flatness optimization; experimental design; membrane fabrication; partcle density; membrane homogeneity
• Note (General): 著者所属: Fraunhofer-Institut fur Mikrostrulturtechnik, Dillenbutger Str
• Persistent ID (NDL): info:ndljp/pid/10472300; https://dl.ndl.go.jp/pid/10472300
• Collection: 障害者向け資料
• Collection (Materials For Handicapped People:1): テキストデータ
• Collection (particular): 国立国会図書館デジタルコレクション > 電子書籍・電子雑誌 > 学術機関 > 学協会; https://dl.ndl.go.jp/collections/B00043
• Acquisition Basis: NII-ELS
• Available (W3CDTF): 2017-08-23
• Date Accepted (W3CDTF): 2017-08-15
• Date Captured (W3CDTF): 2017-08-15
• Format (IMT): application/pdf
• Access Restrictions: インターネット公開
• Availability of remote photoduplication service: 不可
• Periodical Title (Persistent ID (NDL)): info:ndljp/pid/10389309; https://dl.ndl.go.jp/pid/10389309
• Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション; https://dl.ndl.go.jp

• Summary, etc.: In the subquarter-micron range, X-ray lithography and demagnifying ion projection are promising printing techniques. For both methods special designed...