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博士論文

Al2O3/GaN界面の制御とMOSゲート高電子移動度トランジスタへの応用

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Al2O3/GaN界面の制御とMOSゲート高電子移動度トランジスタへの応用

Persistent ID (NDL)
info:ndljp/pid/11679006
Material type
博士論文
Author
金木, 奨太
Publisher
Hokkaido University
Publication date
2021-03-25
Material Format
Digital
Capacity, size, etc.
-
Name of awarding university/degree
北海道大学,博士(工学)
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Notes on use

Note (General):

(主査) 教授 葛西 誠也, 教授 本久 順一, 准教授 佐藤 威友情報科学研究科(情報エレクトロニクス専攻)

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  • Hokkaido University Collection of Scholarly and Academic Papers

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Digital

Material Type
博士論文
Author/Editor
金木, 奨太
Author Heading
Publication, Distribution, etc.
Publication Date
2021-03-25
Publication Date (W3CDTF)
2021-03-25
Alternative Title
Interface Control of Al2O3/GaN Structures for MOS-gate High Electron Mobility Transistors
Contributor
葛西, 誠也
本久, 順一
佐藤, 威友
Degree grantor/type
北海道大学