先端半導体デバイス用プラズマ支援原子層エッチングの表面反応機構
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DOI[10.18910/85387]to the data of the same series
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Provided by：国立国会図書館デジタルコレクションLink to Help Page
2022-11-07 再収集
2022-11-07 再収集
2023-09-08 再収集
2023-09-08 再収集
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- Material Type
- 博士論文
- Title Transcription
- センタンハンドウタイデバイスヨウプラズマシエンゲンシソウエッチングノヒョウメンハンノウキコウ
- Author/Editor
- 平田, 瑛子
- Author Heading
- Publication Date
- 2021-09-24
- Publication Date (W3CDTF)
- 2021-09-24
- Alternative Title
- Surface reaction mechanisms of plasma-assisted atomic layer etching for advanced semiconductor devices
- Degree Grantor
- 大阪大学
- Date Granted
- 2021-09-24