非晶質 In–Ga–Zn–Oxヘテロ接合チャネル薄膜トランジスタのキャリア輸送特性および信頼性
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DOI[10.32149/00002151]to the data of the same series
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2023-09-08 再収集
2023-09-08 再収集
2023-09-08 再収集
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- Material Type
- 博士論文
- Author/Editor
- 佐々木, 大地
- Author Heading
- Publication, Distribution, etc.
- Publication Date
- 2020-03
- Publication Date (W3CDTF)
- 2020-03
- Alternative Title
- Carrier transport properties and reliability of amorphous In–Ga–Zn–O heterojunction channel thin-film transistors
- Contributor
- 古田,守
- Degree Grantor
- 高知工科大学
- Date Granted
- 2020-03-18
- Date Granted (W3CDTF)
- 2020-03-18
- Dissertation Number
- 甲第360号
- Degree Type
- 博士（工学）
- Conferring No. (Dissertation)
- 甲第360号
- Text Language Code
- jpn
- Target Audience
- 一般
- Note (General)
- identifier:高知工科大学, 博士論文.
- DOI
- 10.32149/00002151
- Persistent ID (NDL)
- info:ndljp/pid/12219344
- Collection
- Collection (Materials For Handicapped People:1)
- Collection (particular)
- 国立国会図書館デジタルコレクション > デジタル化資料 > 博士論文
- Acquisition Basis
- 博士論文（自動収集）
- Date Accepted (W3CDTF)
- 2022-04-04T15:10:33+09:00
- Format (IMT)
- application/pdf
- Access Restrictions
- 国立国会図書館内限定公開
- Service for the Digitized Contents Transmission Service
- 図書館・個人送信対象外
- Availability of remote photoduplication service
- 可
- Periodical Title (URI)
- Data Provider (Database)
- 国立国会図書館 : 国立国会図書館デジタルコレクション
- DOI
- 10.32149/00002151
- Source
- fulltextfulltextfulltext
- Access Restrictions
- インターネット公開
- Data Provider (Database)
- 国立情報学研究所 : 学術機関リポジトリデータベース（IRDB）（機関リポジトリ）
- Original Data Provider (Database)
- 高知工科大学 : 高知工科大学学術情報リポジトリ