Hydrogen Diffusion and Termination Effects in Hydrocarbon-Molecular-Ion Implanted Silicon Epitaxial Wafers for Advanced CMOS Image Sensors

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Hydrogen Diffusion and Termination Effects in Hydrocarbon-Molecular-Ion Implanted Silicon Epitaxial Wafers for Advanced CMOS Image Sensors

Persistent ID (NDL): info:ndljp/pid/12302284

Material type: 博士論文

Author: 奥山, 亮輔ほか

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Publication date: 2020-09

Material Format: Digital

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Name of awarding university/degree: 東京工業大学,博士(工学)

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Material Type: 博士論文
Title: Hydrogen Diffusion and Termination Effects in Hydrocarbon-Molecular-Ion Implanted Silicon Epitaxial Wafers for Advanced CMOS Image Sensors
Author/Editor: 奥山, 亮輔
Okuyama, Ryosuke
Author Heading: 奥山, 亮輔
Okuyama, Ryosuke
Publication Date: 2020-09
Publication Date (W3CDTF): 2020-09
Degree grantor/type: 東京工業大学
Date Granted: 2020-09-25
Date Granted (W3CDTF): 2020-09-25
Dissertation Number: 甲第11599号
Degree Type: 博士(工学)
Conferring No. (Dissertation): 甲第11599号
Text Language Code: eng
Target Audience: 一般
Note (General): identifier:oai:t2r2.star.titech.ac.jp:50536676
Persistent ID (NDL): info:ndljp/pid/12302284
https://dl.ndl.go.jp/pid/12302284
Collection: 障害者向け資料
Collection (Materials For Handicapped People:1): テキストデータ
Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 博士論文
https://dl.ndl.go.jp/collections/A00014
Acquisition Basis: 博士論文（自動収集）
Date Accepted (W3CDTF): 2022-07-05T02:30:21+09:00
Date Created (W3CDTF): 2020-08-27
Format (IMT): application/pdf
Access Restrictions: 国立国会図書館内限定公開
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Availability of remote photoduplication service: 可
Periodical Title (URI): http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100830923
Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション
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