重水を用いた原子層成長技術によるHigh-kゲート絶縁膜への重水素添加
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- Material Type
- 記事
- Author/Editor
- 鳥居和功川原孝昭犬宮誠治
- Publication, Distribution, etc.
- Publication Date
- 2005-12-02
- Publication Date (W3CDTF)
- 2005-12-02
- Extent
- 容量 : 02.pdf(1150529bytes)
- Alternative Title
- Deuterium incorporation into High-k gate dielectric by D2O-atomic layer deposition
- Periodical title
- 大陽日酸技報
- No. or year of volume/issue
- (24)