図書

イオン照射による薄膜用基板の表面制御 : 結晶性薄膜作製の低温プロセス化

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イオン照射による薄膜用基板の表面制御 : 結晶性薄膜作製の低温プロセス化

Material type
図書
Author
研究代表者 山内和人
Publisher
大阪大学工学部
Publication date
1997.4
Material Format
Paper
Capacity, size, etc.
31 cm
NDC
-
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[課題番号]: 07555040

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科学研究費補助金(基盤研究(B)(2))研究成果報告書Leave the NDL website.

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Paper

Material Type
図書
Title Transcription
イオン ショウシャ ニ ヨル ハクマクヨウ キバン ノ ヒョウメン セイギョ : ケッショウセイ ハクマク サクセイ ノ テイオン プロセスカ
Author/Editor
研究代表者 山内和人
Author Heading
Publication, Distribution, etc.
Publication Date
1997.4
Publication Date (W3CDTF)
1997
Size
31 cm
Place of Publication (Country Code)
ja