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The results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon [microform] / Barbara J. Belzer and David L. Blackburn (Semiconductor measurement technology) (NIST special publication ; 400-99)

The results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon [microform] / Barbara J. Belzer and David L. Blackburn (Semiconductor measurement technology) (NIST special publication ; 400-99)
Microform図書
1997<YCA-C 13.10:400-99>
National Diet Library
  • Author HeadingBelzer, Barbara J Blackburn, David L National Institute of Standar...

Thermal resistance measurements [microform] / Frank F. Oettinger and David L. Blackburn (NIST special publication ; 400-86) (Semiconductor measurement technology)

Thermal resistance measurements [microform] / Frank F. Oettinger and David L. Blackburn (NIST special publication ; 400-86) (Semiconductor measurement technology)
Microform図書
1990<YCA-C 13.10:400-86>
National Diet Library
  • Author HeadingOettinger, Frank F Blackburn, David L National Institute of Standar...

An automated photovoltaic system for the measurement of resistivity variations in high-resistivity circular silicon slices

An automated photovoltaic system for the measurement of resistivity variations in high-resistivity circular silicon slices
Paper図書
David L. BlackburnU.S. G.P.O.1979
Other Libraries in Japan
  • Author HeadingBlackburn, David L.

Safe operating area limits for power transistors no.400:44

Safe operating area limits for power transistors no.400:44
Digital図書
David L. BlackburnU.S. G.P.O.1977
Other Libraries in Japan
  • Author HeadingBlackburn, David L.

Journal of the Meteorological Society of Japan

Journal of the Meteorological Society of Japan
Paper雑誌雑誌タイトル
Meteorological Society of Japan2001-<Z54-J645>
National Diet Library
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