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Transient phase formation during the growth of epitaxial CoSi2 by annealing of CoTi bi-layers of (100) Si ANL/MSD/CP-87430 DE96 006744 CONF-95115574

Transient phase formation during the growth of epitaxial CoSi2 by annealing of CoTi bi-layers of (100) Si ANL/MSD/CP-87430 DE96 006744 CONF-95115574
Microform規格・テクニカルリポート類
Miller, D. J, Selinder, T. I, Gray, K. E1995<LS-DE96/006744>
National Diet Library

In situ x-ray diffraction study of CoSi2 formation during annealing of a Co/Ti bilayer on Si*(100) ANL/MSD/PP-84782 DE95 012213

In situ x-ray diffraction study of CoSi2 formation during annealing of a Co/Ti bilayer on Si*(100) ANL/MSD/PP-84782 DE95 012213
Microform規格・テクニカルリポート類
Selinder, T. I, Roberts, T. A, Miller, D. J, Beno, M. A, Knapp, G. S1995<LS-DE95/012213>
National Diet Library

TRANSIENT PHASE FORMATION DURING THE GROWTH OF EPITAXIAL COSI/SUB 2/ BY ANNEALING OF COTI BI-LAYERS OF (100) SI (ANL ; ANL/MSD/CP-87430)

TRANSIENT PHASE FORMATION DURING THE GROWTH OF EPITAXIAL COSI/SUB 2/ BY ANNEALING OF COTI BI-LAYERS OF (100) SI (ANL ; ANL/MSD/CP-87430)
Paper図書
MILLER, D.J.// SELINDER, T.I.// GRAY, K.E. (ARGONNE NATIONAL LAB., IL (UNITED STATES). MATERIALS SCIENCE DIV.)Argonne National Laboratory(Argonne National Laboratory)1995.
Other Libraries in Japan
  • Author HeadingMILLER, D.J. SELINDER, T.I. GRAY, K.E.

SCANNING X-RAY DIFFRACTION: A TECHNIQUE WITH HIGH COMPOSITIONAL RESOLUTION FOR STUDYING PHASE FORMATION IN CO-DEPOSITED THIN FILMS (ANL ; ANL/MSD/CP-82716)

SCANNING X-RAY DIFFRACTION: A TECHNIQUE WITH HIGH COMPOSITIONAL RESOLUTION FOR STUDYING PHASE FORMATION IN CO-DEPOSITED THIN FILMS (ANL ; ANL/MSD/CP-82716)
Paper図書
SELINDER, T.I.// MILLER, D.J.// GRAY, K.E.// BENO, M.A.// KNAPP, G.S. (ARGONNE NATIONAL LAB., IL (UNITED STATES))Argonne National Laboratory(Argonne National Laboratory)1994.
Other Libraries in Japan
  • Author HeadingSELINDER, T.I. MILLER, D.J. GRAY, K.E. BENO,...

IN SITU X-RAY DIFFRACTION STUDY OF COSI/SUB 2/ FORMATION DURING ANNEALING OF A CO/TI BILAYER ON SI/SUP */(100) (ANL ; ANL/MSD/PP-84782)

IN SITU X-RAY DIFFRACTION STUDY OF COSI/SUB 2/ FORMATION DURING ANNEALING OF A CO/TI BILAYER ON SI/SUP */(100) (ANL ; ANL/MSD/PP-84782)
Paper図書
SELINDER, T.I.// ROBERTS, T.A.// MILLER, D.J.// BENO, M.A.// KNAPP, G.S.// GRAY, K.E.// OGAWA, S.// FAIR, J.A.// FRASER, D.B. (ARGONNE NATIONAL LAB., IL (UNITED STATES))Argonne National Laboratory(Argonne National Laboratory)1995.
Other Libraries in Japan
  • Author HeadingSELINDER, T.I. ROBERTS, T.A. MILLER, D.J. BE...

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