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白金の触媒作用を用いるMOSデバイスゲ-ト酸化膜の絶縁耐圧性の向上
白金の触媒作用を用いるMOSデバイスゲ-ト酸化膜の絶縁耐圧性の向上
Paper
図書
小林, 光, 大阪大学
2000-2002
<Y151-H12450127>
National Diet Library
次世代極薄高誘電率ゲート絶縁膜中の不純物の挙動に関する理論的研究
次世代極薄高誘電率ゲート絶縁膜中の不純物の挙動に関する理論的研究
Paper
図書
白石賢二, 筑波大学 [著]
[白石賢二]
2004-2005
<Y151-H16560020>
National Diet Library
極薄ゲート酸化膜の原子層制御形成技術の開発
極薄ゲート酸化膜の原子層制御形成技術の開発
Paper
図書
財満, 鎮明, 名古屋大学
1997-1999
<Y151-H09555098>
National Diet Library
Subject Heading
Si/SiO2界面
シリコン初期酸化過程 高分解能エネルギー損失分充法 構造緩...
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