Atomic collision research in Japan : progress report (29);2003
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CONTENTS//5~8
I ELECTRON IMPACT//1~10
Quantitative analysis of CF₄ produced in the SiO₂ etching process by c-C₄F₈, C₃F₈, and C₂F₆ plasmas using in-situ mass spectrometry/K. Furuya ; Y. Hatano/1~2
Generalized oscillator strength of nitric oxide for the valence shell excitations/N. Miyauchi ; H. Kuwabara ; L. F. Zhu ; Y. Ikeda ; Y. Sakai ; H. Suzuki ; T. Takayanagi ; C. Yamada ; S. Ohtani/3~4
Elastic scattering of electrons from water molecules/T. Ono ; M. Takahashi ; K. Tanaka ; K. Soejima ; A. Danjo/5~7
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Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 雑誌
- Volume
- (29);2003
- Author Heading
- 原子衝突研究協会 ゲンシ ショウトツ ケンキュウ キョウカイ ( 00813895 )Authorities
- Publication, Distribution, etc.
- Publication Date
- 2003-12
- Publication Date (W3CDTF)
- 2003-12
- Year and volume of publication
- [ ] -
- Size
- 26 cm
- Place of Publication (Country Code)
- JP