Volume number16;NOVEMBER 1994
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Proceedings of Symposium on Dry Process 16;NOVEMBER 1994

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Proceedings of Symposium on Dry Process16;NOVEMBER 1994

Call No. (NDL)
Z63-B381
Persistent ID (NDL)
info:ndljp/pid/11019428
Material type
雑誌
Publisher
Institute of Electrical Engineers of Japan
Publication date
1994-11
Publication Frequency
-
Material Format
Digital
Capacity, size, etc.
28 cm
NDC
-
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Notes on use

Holding issue:

7:1985 - 22:2000

Volume Range:

[ ] - 22:2000

Note (General):

Description based on the latest issueTitle in Japanese: Dorai Purosesu Sinpozyumu

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Table of Contents

  • THE 16th SYMPOSIUM ON DRY PROCESS PROGRAM = 第16回ドライプロセスシンポジウム プログラム//5~8

  • Thursday, Nobember 10, 1994 = 11月10日(木)//~116

  • Session I : PROCESSING PLASMA = Session I プロセス用プラズマ//~48

  • I-1 <Invited Paper> Comparison of the Ion Velocity Distribution in Different High Density Reactors (ECR, Helicon, DECR, ......)/N. Sadeghi/1~1

  • I-2 Real-Time Feedback Control of 2 -Dimensional Parameters in Etching Plasmas/P. L. G. Ventzek ; N. Yamada ; K. Kitamori ; Y. Sakai ; H. Tagashira/3~8

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Digital

Material Type
雑誌
Volume
16;NOVEMBER 1994
Publication Date
1994-11
Publication Date (W3CDTF)
1994-11
Year and volume of publication
[ ] - 22:2000
Size
28 cm
Alternative Title
Dorai Purosesu Sinpozyumu
Place of Publication (Country Code)
JP