Journal of photopolymer science and technology

• Material Type: 雑誌
• Title: Journal of photopolymer science and technology
• Volume: 37(5):2024
• Author Heading: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )Authorities; Conference of Photopolymer Science and Technology ( 01236612 )Authorities; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )Authorities
• Publication, Distribution, etc.: Chiba : The Society of Photopolymer Science and Technology
• Publication Date: 2024
• Publication Date (W3CDTF): 2024
• Note (Publication, distribution, etc.): Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• Year and volume of publication: v. 6, no. 1 (1993)-
• Size: 29cm
• ISSN (Periodical Title): 0914-9244
• ISSN-L (Periodical Title): 0914-9244
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZP48
• Note (General): Description based on the latest issue; Frequency varies
• Holding library: 国立国会図書館
• Call No.: Z53-W515
• Related Material: 区分換; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000156586; http://id.ndl.go.jp/bib/000000156586
• Cataloging Rule: National Diet Library Cataloging Rules for Serials

Table of Contents

Feature-size Control by Pattern Transfer Etching in Nanoimprint Lithography for Half-pitch 24 nm Damascene Interconnect

Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5°C with TiO₂-SiO₂ Gas-Permeable Porous Mold

Hybrid Soft Replica Molds for Residual Layer-Free Patterning

Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching

Application of Self-aligned Quadrable Patterning to Fabrication of Nanoimprint Mold with Sub-12-nm Half-pitch