Pulsed XeCl excimer laser annealing of silicon film
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Table of Contents
TABLE OF CONTENTS
p1
CHAPTER1 INTRODUCTION
1.1 Motivation of This Work
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1.2 Organization
p5
CHAPTER2 PULSED EXCIMER LASER ANNEALING OF a-Si:H
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- Material Type
- 博士論文
- Author/Editor
- 鮫島俊之 [著]
- Author Heading
- 鮫島, 俊之 サメシマ, トシユキ
- Alternative Title
- XeClエキシマレーザを用いたシリコン膜のアニーリングの研究 XeCl エキシマ レーザ オ モチイタ シリコンマク ノ アニーリング ノ ケンキュウ
- Degree grantor/type
- 静岡大学
- Date Granted
- 平成3年2月21日
- Date Granted (W3CDTF)
- 1991
- Dissertation Number
- 乙第34号
- Degree Type
- 工学博士