博士論文
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Heteroepitaxial growth of GaAs on Si by MOCVD and its application to optoelectronic devices

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Heteroepitaxial growth of GaAs on Si by MOCVD and its application to optoelectronic devices

Call No. (NDL)
UT51-91-G14
Bibliographic ID of National Diet Library
000000239949
Persistent ID (NDL)
info:ndljp/pid/3054327
Material type
博士論文
Author
江川孝志 [著]
Publisher
-
Publication date
-
Material Format
Paper・Digital
Capacity, size, etc.
-
Name of awarding university/degree
名古屋工業大学,工学博士
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Notes on use

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博士論文

Table of Contents

  • CONTENTS

  • Chapter 1. Introduction

    p1

  • 1.1 Background

    p1

  • 1.2 Heteroepitaxial Growth of GaAs Layers on Si

    p4

  • 1.3 Device Applications

    p6

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  • Nagoya Institute of Technology Repository System

    Digital
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Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper Digital

Material Type
博士論文
Author/Editor
江川孝志 [著]
Author Heading
江川, 孝志 エガワ, タカシ
Alternative Title
MOCVD法を用いたSi上へのGaAsヘテロエピタキシャル成長および光電子デバイスへの応用 MOCVDホウ オ モチイタ Siジョウ エ ノ GaAs ヘテロエピタキシャル セイチョウ オヨビ コウデンシ デバイス エ ノ オウヨウ
Degree grantor/type
名古屋工業大学
Date Granted
平成3年3月23日
Date Granted (W3CDTF)
1991
Dissertation Number
甲第61号
Degree Type
工学博士