Chemical vapor deposition of SiO[2] and (Ba,Sr)TiO[3] films and their application to electronic devices
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国立国会図書館デジタルコレクション
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Table of Contents
要旨
p5
CONTENTS
1.Introduction
p1
1.1 Chemical vapor deposition of SiO₂ films
p5
1.2 Chemical vapor deposition of(Ba,Sr)TiO₃ films
p11
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Bibliographic Record
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- Material Type
- 博士論文
- Author/Editor
- 川原孝昭 [著]
- Author Heading
- 川原, 孝昭 カワハラ, タカアキ
- Alternative Title
- CVD法によるSiO[2]及び (Ba,Sr)TiO[3]薄膜の形成と電子デバイスへの応用 CVDホウ ニ ヨル SiO2 オヨビ (Ba,Sr)TiO3 ハクマク ノ ケイセイ ト デンシ デバイス エ ノ オウヨウ
- Degree grantor/type
- 東京大学
- Date Granted
- 平成9年3月17日
- Date Granted (W3CDTF)
- 1997
- Dissertation Number
- 乙第13294号
- Degree Type
- 博士 (工学)