博士論文
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Studies of Inductively Coupled Chlorine Plasma for Semiconductor Etching Processes Using Time-resolved Laser Spectroscopy

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Studies of Inductively Coupled Chlorine Plasma for Semiconductor Etching Processes Using Time-resolved Laser Spectroscopy

Call No. (NDL)
UT51-2001-N693
Bibliographic ID of National Diet Library
000000409452
Persistent ID (NDL)
info:ndljp/pid/3188869
Material type
博士論文
Author
熊谷慎也 [著]
Publisher
[熊谷慎也]
Publication date
2001
Material Format
Paper・Digital
Capacity, size, etc.
1冊
Name of awarding university/degree
東北大学,博士 (工学)
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Note (General):

博士論文

Table of Contents

  • Contents

    p1

  • 1 Introduction

    p4

  • 1.1 Background

    p4

  • 1.2 Recent problems in Cl₂ plasma etching and purpose of this dissertation

    p9

  • 1.3 Outline of this thesis

    p17

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Bibliographic Record

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Paper Digital

Material Type
博士論文
Author/Editor
熊谷慎也 [著]
Author Heading
熊谷, 慎也 クマガイ, シンヤ
Publication, Distribution, etc.
Publication Date
2001
Publication Date (W3CDTF)
2001
Extent
1冊
Alternative Title
時間分解レーザー分光法を用いた半導体エッチングプロセスのための誘導結合塩素プラズマの研究 ジカン ブンカイ レーザー ブンコウホウ オ モチイタ ハンドウタイ エッチング プロセス ノ タメ ノ ユウドウ ケツゴウ エンソ プラズマ ノ ケンキュウ
Degree grantor/type
東北大学