Jump to main content
博士論文

A study of Si/SiO2 interfacial properties for ULSI fabrication

Icons representing 博士論文
The cover of this title could differ from library to library. Link to Help Page

A study of Si/SiO2 interfacial properties for ULSI fabrication

Call No. (NDL)
UT51-2001-S418
Bibliographic ID of National Diet Library
000000415983
Persistent ID (NDL)
info:ndljp/pid/3191882
Material type
博士論文
Author
土明正勝 [著]
Publisher
[土明正勝]
Publication date
[2001]
Material Format
Paper・Digital
Capacity, size, etc.
1冊
Name of awarding university/degree
東京工業大学,博士 (工学)
View All

Notes on use

Note (General):

博士論文

Table of Contents

Provided by:国立国会図書館デジタルコレクションLink to Help Page
  • 論文目録

  • Contents

    p2

  • 1 Si-SiO₂ Systems and Si/SiO₂ Interfaces in ULSI

    p5

  • 1-1. Background

    p6

  • 1-2. Objective

    p9

Read in Disability Resources

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper Digital

Material Type
博士論文
Author/Editor
土明正勝 [著]
Author Heading
土明, 正勝 ツチアキ, マサカツ
Publication, Distribution, etc.
Publication Date
[2001]
Publication Date (W3CDTF)
2001
Extent
1冊
Alternative Title
大規模集積化回路製造に関わるSi/SiO2界面特性の研究 ダイキボ シュウセキカ カイロ セイゾウ ニ カカワル Si
Degree grantor/type
東京工業大学