Search by Bookstore
Technical Program
Oral Presentations 1
Thursday 17 July-Kuramae Hall
Plenary Presentations
Session Chair:Sunao Ishihara(UTokyo)
次世代リソグラフィ技術へのMEMS応用-超並列電子線描画とEUV用フィルタ-
Application of MEMS technology to next generation lithography-Massive parallel electron beam lithography and filter for EUV-/ 1
ミニマルファブ構想とミニマルファブの開発
Concept and development of minimal fab/ 3
Search by Bookstore
Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 図書
- ISBN
- 978-4-86348-438-2
- Title
- Title Transcription
- ジセダイ リソグラフィ ワークショップ ヨコウシュウ
- Author Heading
- 応用物理学会 オウヨウ ブツリ ガッカイ ( 00281497 )Authorities
- Publication, Distribution, etc.
- Publication Date
- [2014]
- Publication Date (W3CDTF)
- 2014
- Extent
- 83p
- Size
- 30cm