図書

最新フォトレジスト材料開発とプロセス最適化技術 (エレクトロニクスシリーズ)

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最新フォトレジスト材料開発とプロセス最適化技術 = Advanced technologies for functional resist materials and process optimization

(エレクトロニクスシリーズ)

Call No. (NDL)
PA441-L152
Bibliographic ID of National Diet Library
028685861
Material type
図書
Author
河合晃 監修
Publisher
シーエムシー出版
Publication date
2017.9
Material Format
Paper
Capacity, size, etc.
320p ; 26cm
NDC
578.4
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Table of Contents

  • 目次

  • 【第I編 総論】

  • 第1章 リソグラフィープロセス概論

    河合晃

  • 1 はじめに/ 1

  • 2 リソグラフィープロセス/ 1

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Paper

Material Type
図書
ISBN
978-4-7813-1263-7
Title Transcription
サイシン フォトレジスト ザイリョウ カイハツ ト プロセス サイテキカ ギジュツ
Author/Editor
河合晃 監修
Author Heading
河合, 晃 カワイ, アキラ ( 01226447 )Authorities
Publication, Distribution, etc.
Publication Date
2017.9
Publication Date (W3CDTF)
2017