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Table of Contents
Provided by：国立国会図書館Link to Help Page
目次
【第I編 総論】
第1章 リソグラフィープロセス概論
1 はじめに/ 1
2 リソグラフィープロセス/ 1
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- Material Type
- 図書
- ISBN
- 978-4-7813-1263-7
- Title Transcription
- サイシン フォトレジスト ザイリョウ カイハツ ト プロセス サイテキカ ギジュツ
- Author/Editor
- 河合晃 監修
- Series Title
- Author Heading
- 河合, 晃 カワイ, アキラ ( 01226447 )Authorities
- Publication, Distribution, etc.
- Publication Date
- 2017.9
- Publication Date (W3CDTF)
- 2017
- Extent
- 320p
- Size
- 26cm
- Alternative Title
- Advanced technologies for functional resist materials and process optimization Advanced technologies for functional resist materials and process optimizationAdvanced technologies for functional resist materials and process optimization
- Place of Publication (Country Code)
- JP
- Text Language Code
- jpn
- Subject Heading
- 感光性樹脂 カンコウセイジュシ ( 00576718 )Authoritiesリソグラフィー リソグラフィー ( 00576369 )Authorities
- NDC 10th ed.
- NDLC
- NDC (Introduction of Reference Books)
- 578.4
- Target Audience
- 一般
- Note (Bibliography)
- 文献あり
- Price
- 82000円
- Holding library
- 国立国会図書館
- Call No.
- PA441-L152
- Data Provider (Database)
- 国立国会図書館 : 国立国会図書館蔵書
- Bibliographic ID (NDL)
- 028685861
- National Bibliography No. (JPNO)
- 23002278
- Cataloging Rule
- Nippon Cataloguing Rules 1987 Revised Edition
- Bibliographic Record Category (NDL)
- 111