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電子書籍・電子雑誌Journal of laser micro/nanoengineering
Volume number13 (2)
ArticleLaser-indu...

Laser-induced backside wet etching of SiO2 with a visible ultrashort laser pulse by using KMnO4 solution as an absorber liquid

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DOI[10.2961/jlmn.2018.02.0001]to the data of the same series

Laser-induced backside wet etching of SiO2 with a visible ultrashort laser pulse by using KMnO4 solution as an absorber liquid

Persistent ID (NDL)
info:ndljp/pid/11282170
Material type
記事
Author
M. Ehrhardtほか
Publisher
Japan Laser Processing Society
Publication date
2018-09
Material Format
Digital
Journal name
Journal of laser micro/nanoengineering 13(2)
Publication Page
-
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Material Type
記事
Title
Laser-induced backside wet etching of SiO2 with a visible ultrashort laser pulse by using KMnO4 solution as an absorber liquid
Author/Editor
M. Ehrhardt
P. Lorenz
B. Han
Publication, Distribution, etc.
日本 : Japan Laser Processing Society
Publication Date
2018-09
Publication Date (W3CDTF)
2018-09
Periodical title
Journal of laser micro/nanoengineering
No. or year of volume/issue
13(2)
Volume
13(2)
ISSN (Periodical Title)
1880-0688