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Novel molecular ion implantation technology for proximity gettering in silicon wafer for CMOS image sensor

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DOI[10.14989/doctor.k22442]to the data of the same series

Novel molecular ion implantation technology for proximity gettering in silicon wafer for CMOS image sensor

Persistent ID (NDL)
info:ndljp/pid/11526909
Material type
博士論文
Author
Hirose, Ryo
Publisher
Kyoto University
Publication date
2020-03-23
Material Format
Digital
Capacity, size, etc.
-
Name of awarding university/degree
京都大学,博士(工学),Doctor of Philosophy (Engineering)
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元資料の権利情報 : 題目　：Proximity gettering of silicon wafers using CH3O multielement molecular ion implantation technique 掲載論文誌：Japanese Journal of Applied Ph...

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Material Type
博士論文
Title
Novel molecular ion implantation technology for proximity gettering in silicon wafer for CMOS image sensor
Author/Editor
Hirose, Ryo
Author Heading
Hirose, Ryo
Publication, Distribution, etc.
Kyoto University
Publication Date
2020-03-23
Publication Date (W3CDTF)
2020-03-23
Alternative Title
CMOSイメージセンサ用Siウェーハにおける近接ゲッタリングのための新規分子イオン注入技術
Contributor
斉藤, 学
神野, 郁夫
松尾, 二郎
Degree grantor/type
京都大学