ジクロロシランおよびヘキサクロロジシランを用いた原子層堆積法による成膜反応メカニズムの研究
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- Material Type
- 記事
- Author/Editor
- 村田逸人鈴木克昌
- Publication, Distribution, etc.
- Publication Date
- 2017-12
- Publication Date (W3CDTF)
- 2017-12
- Alternative Title
- The study on reaction mechanism of atomic layer deposition to form thin films using dichlorosilane and hexachlorodisilane
- Periodical title
- 大陽日酸技報
- No. or year of volume/issue
- (36)
- Volume
- (36)