Atomic layer deposition process of titanium nitride using an ultra-dry hydrazine gas

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Atomic layer deposition process of titanium nitride using an ultra-dry hydrazine gas

Persistent ID (NDL): info:ndljp/pid/13763183

Material type: 記事

Author: Murata Hayatoほか

Publisher: 大陽日酸

Publication date: 2021-03

Material Format: Digital

Journal name: 大陽日酸技報 (39)

Publication Page: -

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Material Type: 記事
Title: Atomic layer deposition process of titanium nitride using an ultra-dry hydrazine gas
Author/Editor: Murata Hayato
Shimizu Hideharu
Andachi Keisuke
Publication, Distribution, etc.: 日本 : 大陽日酸
Publication Date: 2021-03
Publication Date (W3CDTF): 2021-03
Alternative Title: 無水ヒドラジンを用いたTiN ALD(原子層堆積法)プロセス
Periodical title: 大陽日酸技報
No. or year of volume/issue: (39)
Volume: (39)
Text Language Code: eng
Persistent ID (NDL): info:ndljp/pid/13763183
https://dl.ndl.go.jp/pid/13763183
Collection: 障害者向け資料
Collection (Materials For Handicapped People:1): テキストデータ
Collection (particular): 国立国会図書館デジタルコレクション > 電子書籍・電子雑誌 > その他
https://dl.ndl.go.jp/collections/B00035
Acquisition Basis: インターネット資料収集保存事業（WARP）
Date Accepted (W3CDTF): 2024-10-11T08:47:47+09:00
Date Captured (W3CDTF): 2021-04-16
Format (IMT): application/pdf
Access Restrictions: インターネット公開
Availability of remote photoduplication service: 不可
Periodical Title (URI): https://warp.da.ndl.go.jp/info:ndljp/pid/11664920/www.tn-sanso.co.jp/jp/rd/giho/report39.html
Periodical Title (Persistent ID (NDL)): info:ndljp/pid/13763181
https://dl.ndl.go.jp/pid/13763181
Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション
https://dl.ndl.go.jp