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博士論文

A study of fundamentals related to plasma processing of silicon devices

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A study of fundamentals related to plasma processing of silicon devices

Call No. (NDL)
UT51-94-J258
Bibliographic ID of National Diet Library
000000271231
Persistent ID (NDL)
info:ndljp/pid/3075933
Material type
博士論文
Author
名村高 [著]
Publisher
-
Date granted
平成6年3月23日
Material Format
Paper・Digital
Capacity, size, etc.
-
Degree grantor and degree
京都大学,博士 (工学)
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博士論文

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Table of Contents

Provided by：国立国会図書館デジタルコレクション

  • 論文目録

  • Contents

    p2

  • 1 Introduction

    p1

  • 1.1 Role of plasma processing in microelectronics

    p1

  • 1.2 Elementary problems in plasma processing of silicon devices

    p2

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Bibliographic Record

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Paper Digital

Material Type
博士論文
Title
A study of fundamentals related to plasma processing of silicon devices
Author/Editor
名村高 [著]
Author Heading
名村, 高 ナムラ, タカシ
Alternative Title
シリコン半導体デバイスのプラズマ加工に関わる基礎的研究 シリコン ハンドウタイ デバイス ノ プラズマ カコウ ニ カカワル キソテキ ケンキュウ
Degree Grantor
京都大学
Date Granted
平成6年3月23日
Date Granted (W3CDTF)
1994
Dissertation Number
乙第8529号
Degree Type
博士 (工学)