Anhydrous hydrogen fluoride for selective etch processes : measurement and control of water and metallic impurities

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Anhydrous hydrogen fluoride for selective etch processes : measurement and control of water and metallic impurities

Persistent ID (NDL): info:ndljp/pid/3513043

Material type: 記事

Author: Millward Andrewほか

Publisher: 大陽日酸

Publication date: 2009-11-30

Material Format: Digital

Journal name: 大陽日酸技報 (28)

Publication Page: -

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Material Type: 記事
Title: Anhydrous hydrogen fluoride for selective etch processes : measurement and control of water and metallic impurities
Author/Editor: Millward Andrew
Davia Dan
Wyse Carrie
Publication, Distribution, etc.: 日本 : 大陽日酸
Publication Date: 2009-11-30
Publication Date (W3CDTF): 2009-11-30
Extent: 容量 : tnscgiho28_04.pdf(746914bytes)
Alternative Title: 選択エッチングプロセス用無水フッ化水素に関する研究 : 水分及び金属不純物の管理と測定
Periodical title: 大陽日酸技報
No. or year of volume/issue: (28)
Volume: (28)
Text Language Code: eng
Persistent ID (NDL): info:ndljp/pid/3513043
https://dl.ndl.go.jp/pid/3513043
Collection: 障害者向け資料
Collection (Materials For Handicapped People:1): テキストデータ
Collection (particular): 国立国会図書館デジタルコレクション > 電子書籍・電子雑誌 > その他
https://dl.ndl.go.jp/collections/B00035
Acquisition Basis: インターネット資料収集保存事業（WARP）
Date Accepted (W3CDTF): 2012-07-26T01:08:01+09:00
Date Captured (W3CDTF): 2011-01-18
Format (IMT): application/pdf
Access Restrictions: インターネット公開
Availability of remote photoduplication service: 不可
Periodical Title (URI): https://warp.da.ndl.go.jp/info:ndljp/pid/1284606/www.tn-sanso-giho.com/report28.html
Periodical Title (Persistent ID (NDL)): info:ndljp/pid/3513039
https://dl.ndl.go.jp/pid/3513039
Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション
https://dl.ndl.go.jp