最適入射角度の低速酸素イオンを用いたSIMSによるボロンのゲート酸化膜突き抜け現象の解析
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- Material Type
- 記事
- Author/Editor
- 川島義也小山晋安藤公一
- Publication, Distribution, etc.
- Publication Date
- 2003-07
- Publication Date (W3CDTF)
- 2003-07
- Alternative Title
- Study of boron penetration through gate oxide layer by SIMS under optimized incident angle of low-energy oxygen primary ion beam
- Periodical title
- 表面科学 : 日本表面科学会誌
- No. or year of volume/issue
- 24(7)
- Volume
- 24(7)