Characteristics of recrystallized poly-Si film prepared by ELA of a-Si deposited on SiO2/SiN/glass using PE-CVD method

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Characteristics of recrystallized poly-Si film prepared by ELA of a-Si deposited on SiO2/SiN/glass using PE-CVD method

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Material Type: 記事
Title: Characteristics of recrystallized poly-Si film prepared by ELA of a-Si deposited on SiO2/SiN/glass using PE-CVD method
Author/Editor: Naoya Kawamoto
Hisashi Abe
Naoto Matsuo
Publication, Distribution, etc.: 日本 : 山口大学
Publication Date: 2001-10
Publication Date (W3CDTF): 2001-10
Periodical title: 山口大学工学部研究報告
No. or year of volume/issue: 52(1)
Volume: 52(1)
Text Language Code: eng
Persistent ID (NDL): info:ndljp/pid/8771651
https://dl.ndl.go.jp/pid/8771651
Collection: 障害者向け資料
Collection (Materials For Handicapped People:1): テキストデータ
Collection (particular): 国立国会図書館デジタルコレクション > 電子書籍・電子雑誌 > 学術機関 > 国立大学
https://dl.ndl.go.jp/collections/B00031
Acquisition Basis: インターネット資料収集保存事業（WARP）
Date Accepted (W3CDTF): 2014-10-14T21:38:02+09:00
Date Captured (W3CDTF): 2008-08-05
Format (IMT): application/pdf
Access Restrictions: インターネット公開
Availability of remote photoduplication service: 不可
Periodical Title (URI): https://warp.da.ndl.go.jp/info:ndljp/pid/282311/memoirs.lib-e.yamaguchi-u.ac.jp/521/
Periodical Title (Persistent ID (NDL)): info:ndljp/pid/8771650
https://dl.ndl.go.jp/pid/8771650
Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション
https://dl.ndl.go.jp