図書

最新フォトレジスト材料開発とプロセス最適化技術 普及版 (TECHNICAL LIBRARY. エレクトロニクスシリーズ)

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最新フォトレジスト材料開発とプロセス最適化技術 = Advanced Technologies for Functional Resist Materials and Process Optimization

普及版

(TECHNICAL LIBRARY. エレクトロニクスシリーズ)

Call No. (NDL)
PA441-R12
Bibliographic ID of National Diet Library
033627827
Material type
図書
Author
河合晃 監修
Publisher
シーエムシー出版
Publication date
2024.8
Material Format
Paper
Capacity, size, etc.
320p ; 26cm
NDC
578.4
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Detailed bibliographic record

Summary, etc.:

フォトレジスト材料および露光技術の特長を最大限に発揮させるためのレジストプロセス技術の最適化を徹底解説した1冊。(Provided by: 出版情報登録センター(JPRO))

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Table of Contents

  • 【第I編 総論】

  • 第1章 リソグラフィープロセス概論

  • 1 はじめに

  • 2 リソグラフィープロセス

  • 3 3層レジストプロセス

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Paper

Material Type
図書
ISBN
978-4-7813-1774-8
Title Transcription
サイシン フォトレジスト ザイリョウ カイハツ ト プロセス サイテキカ ギジュツ
Author/Editor
河合晃 監修
Edition
普及版
Author Heading
監修者 : 河合, 晃 カワイ, アキラ ( 01226447 )Authorities
Publication, Distribution, etc.
Publication Date
2024.8