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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)
Paper図書
SPIE--the International Society for Optical Engineeringc1985.<M15-A1319>
National Diet Library
  • Author HeadingBlais, Phillip D. International Society for Hyb...

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 393)

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 393)
Paper図書
SPIEc1983.<ND386-39>
National Diet Library
  • Author HeadingBlais, Phillip D. Society of Photo-optical Inst...

Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 333)

Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 333)
Paper図書
International Society for Optical Engineering1982.<M15-A5689>
National Diet Library
  • Author HeadingBlais, Phillip D. International Society for Hyb...

Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California pbk.

Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California pbk.
Paper図書
Phillip D. Blais, chair/editor ; sponsored by SPIE--the International Society for Optical EngineeringThe Societyc1987
Other Libraries in Japan
  • Author HeadingBlais, Phillip D. Society of Photo-optical Inst...

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California pbk.

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California pbk.
Paper図書
Phillip D. Blais, chairman/editorSPIE--the International Society for Optical Engineeringc1986
Other Libraries in Japan
  • Author HeadingBlais, Phillip D. Society of Photo-optical Inst...

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California pbk.
Paper図書
Philliip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid MicroelectronicsSPIE--the International Society for Optical Engineeringc1985
Other Libraries in Japan
  • Author HeadingBlais, Phillip D. International Society for Hyb...

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California pbk.
Paper図書
Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working GroupSPIEc1983
Other Libraries in Japan
  • Author HeadingBlais, Phillip D. Society of Photo-optical Inst...

Submicron lithography pbk.

Submicron lithography pbk.
Paper図書
Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, CaliforniaInternational Society for Optical Engineering1982
Other Libraries in Japan
  • Author HeadingBlais, Phillip D. International Society for Hyb...

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