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低誘電率・高絶縁耐力プラズマ堆積a-C:F膜による機器絶縁の軽量化と耐電圧向上
低誘電率・高絶縁耐力プラズマ堆積a-C:F膜による機器絶縁の軽量化と耐電圧向上
Paper
図書
酒井洋輔, 北海道大学 [著]
[酒井洋輔]
2005-2007
<Y151-H17360121>
National Diet Library
機器導体部のプラズマCVD絶縁膜(CxFy高分子)によるSF6ガス代替絶縁
機器導体部のプラズマCVD絶縁膜(CxFy高分子)によるSF6ガス代替絶縁
Paper
図書
酒井洋輔, 北海道大学 [著]
[酒井洋輔]
2003-2004
<Y151-H15360143>
National Diet Library
低誘電率・高絶縁耐力プラズマ堆積CxFy膜を用いたSF6代替絶縁方式の開発
低誘電率・高絶縁耐力プラズマ堆積CxFy膜を用いたSF6代替絶縁方式の開発
Paper
図書
酒井洋輔, 北海道大学 [著]
[酒井洋輔]
2001-2003
<Y151-H13555077>
National Diet Library
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