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Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 5: new materials, processes, and equipment. : international symposium on advanced gate stack, source/drain and channel engineering for Si-based CMOS: new materials, processes and equipment, 5 : 215th meeting of the Electrochemical Society : May 2009, San Frabcisco, CA. (ECS Transactions ; 19 (no. 1))

Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 5: new materials, processes, and equipment. : international symposium on advanced gate stack, source/drain and channel engineering for Si-based CMOS: new materials, processes and equipment, 5 : 215th meeting of the Electrochemical Society : May 2009, San Frabcisco, CA. (ECS Transactions ; 19 (no. 1))
紙図書
Electrochemical Societyc2009.<M17-10-1506>
国立国会図書館
  • 件名...-- Congresses. Metal oxide semiconductors -- Materials -- Congresses. Gate array circuits -- Materi...

CMOS gate-stack scaling -- materials, interfaces and reliability implications : symposium held April 14-16, 2009, San Francisco, California, U.S.A. : symposium C, "CMOS gate-stack scaling -- materials, interfaces and reliability implications" : 2009 MRS spring meeting : Apr 2009, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 1155)

CMOS gate-stack scaling -- materials, interfaces and reliability implications : symposium held April 14-16, 2009, San Francisco, California, U.S.A. : symposium C, "CMOS gate-stack scaling -- materials, interfaces and reliability implications" : 2009 MRS spring meeting : Apr 2009, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 1155)
紙図書
Materials Research Societyc2009.<M17-10-2160>
国立国会図書館
  • 件名...-- Congresses. Metal oxide semiconductors -- Materials -- Congresses. Silicides -- Congresses. Gate...

CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A. : symposium D, "CMOS front-end materials and process technology" : 2003 MRS spring meeting : Apr 2003, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 765)

CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A. : symposium D, "CMOS front-end materials and process technology" : 2003 MRS spring meeting : Apr 2003, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 765)
紙図書
Materials Research Societyc2003.<M17-04-1224>
国立国会図書館
  • 件名Metal oxide semiconductors -- Materials -- Congresses. Metal oxide semiconductors, C...

Novel materials and processes for advanced CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A. : 2002 MRS fall meeting in Boston : Dec 2002, Boston, MA. (Materials Research Society Symposia Proceedings ; 745)

Novel materials and processes for advanced CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A. : 2002 MRS fall meeting in Boston : Dec 2002, Boston, MA. (Materials Research Society Symposia Proceedings ; 745)
紙図書
Materials Research Societyc2003.<M17-03-1779>
国立国会図書館
  • 件名Metal oxide semiconductors -- Materials -- Congresses. Metal oxide semiconductors, C...

検索結果は以上です。

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