Journal of photopolymer science and technology

• Material Type: 雑誌
• Title: Journal of photopolymer science and technology
• Volume: 37(3):2024
• Author Heading: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )Authorities; Conference of Photopolymer Science and Technology ( 01236612 )Authorities; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )Authorities
• Publication, Distribution, etc.: Chiba : The Society of Photopolymer Science and Technology
• Publication Date: 2024
• Publication Date (W3CDTF): 2024
• Note (Publication, distribution, etc.): Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• Year and volume of publication: v. 6, no. 1 (1993)-
• Size: 29cm
• ISSN (Periodical Title): 0914-9244
• ISSN-L (Periodical Title): 0914-9244
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZP48
• Note (General): Description based on the latest issue; Frequency varies
• Holding library: 国立国会図書館
• Call No.: Z53-W515
• Related Material: 区分換; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000156586; http://id.ndl.go.jp/bib/000000156586
• Cataloging Rule: National Diet Library Cataloging Rules for Serials

Table of Contents

Advanced Development Techniques for Extreme : Tight Pitch Patterning

A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography

Dry Deposition and Dry Development of Metal Oxide Based Photoresist

Novel EUV Underlayer Design for Metal Oxide Resist Patterning

Going Beyond the Ohnishi Parameter : Correlating Dissociation Energies to Polymer Etch Rates