Japanese journal of applied physics : JJAP48(6)(2);June 2009

• Material Type: 雑誌
• Title: Japanese journal of applied physics : JJAP
• Volume: 48(6)(2);June 2009
• Author Heading: 応用物理学会 オウヨウ ブツリ ガッカイ ( 00281497 )Authorities
• Publication, Distribution, etc.: Tokyo : The Japan Society of Applied Physics
• Publication Date: 2009-06
• Publication Date (W3CDTF): 2009-06
• Year and volume of publication: v. 47, no. 1 (Jan. 2008)-
• Size: 30cm
• ISSN (Periodical Title): 0021-4922
• ISSN-L (Periodical Title): 0021-4922
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZM35
• Note (General): Description based on the latest issue; Issued in 2 parts
• DOI: 10.11501/11226761; https://doi.org/10.11501/11226761
• Persistent ID (NDL): info:ndljp/pid/11226761; https://dl.ndl.go.jp/pid/11226761
• Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌; https://dl.ndl.go.jp/collections/A00002
• Producer: 国立国会図書館
• Production year (W3CDTF): 2019-03-15
• Date Accepted (W3CDTF): 2019-01-17T10:37:16+09:00
• Format (IMT): image/jp2
• Access Restrictions: 国立国会図書館内限定公開
• Service for the Digitized Contents Transmission Service: 図書館・個人送信対象
• Availability of remote photoduplication service: 可
• Year and volume of holding: v. 47, no. 1 (Jan. 2008)-v. 52, no. 12 (Dec. 2013)
• Call No.: Z53-A375
• Original Material (JPNO): 01018065
• Periodical Title (Persistent ID (NDL)): info:ndljp/pid/11227790; https://dl.ndl.go.jp/pid/11227790
• Replaces (Persistent ID (NDL)): info:ndljp/pid/11196685; https://dl.ndl.go.jp/pid/11196685
• Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション; https://dl.ndl.go.jp

Table of Contents

CONTENTS/

Special issue: Microprocesses and nanotechnology//06FA01-06FK10～、巻頭2p～

DUV, VUV, EUV Lithography and Metrology//06FA01-1～

Progress in extending immersion lithography for the 32nm node and beyond/Harry Sewell ; Alek Chen ; Jo Finders/06FA01-1～6

Lithographic performance of extreme ultraviolet full-field exposure tool at Selete/Kazuo Tawarayama ; Hajime Aoyama ; Takashi Kamo/06FA02-1～6