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Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 5: new materials, processes, and equipment. : international symposium on advanced gate stack, source/drain and channel engineering for Si-based CMOS: new materials, processes and equipment, 5 : 215th meeting of the Electrochemical Society : May 2009, San Frabcisco, CA. (ECS Transactions ; 19 (no. 1))

Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 5: new materials, processes, and equipment. : international symposium on advanced gate stack, source/drain and channel engineering for Si-based CMOS: new materials, processes and equipment, 5 : 215th meeting of the Electrochemical Society : May 2009, San Frabcisco, CA. (ECS Transactions ; 19 (no. 1))
Paper図書
Electrochemical Societyc2009.<M17-10-1506>
National Diet Library

CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A. : symposium D, "CMOS front-end materials and process technology" : 2003 MRS spring meeting : Apr 2003, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 765)

CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A. : symposium D, "CMOS front-end materials and process technology" : 2003 MRS spring meeting : Apr 2003, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 765)
Paper図書
Materials Research Societyc2003.<M17-04-1224>
National Diet Library

Novel materials and processes for advanced CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A. : 2002 MRS fall meeting in Boston : Dec 2002, Boston, MA. (Materials Research Society Symposia Proceedings ; 745)

Novel materials and processes for advanced CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A. : 2002 MRS fall meeting in Boston : Dec 2002, Boston, MA. (Materials Research Society Symposia Proceedings ; 745)
Paper図書
Materials Research Societyc2003.<M17-03-1779>
National Diet Library

Gate dielectric integrity: material, process, and tool qualification. : conference on gate dielectric integrity (GDI) : Jan 1999, San Jose, CA. (STP ; 1382)

Gate dielectric integrity: material, process, and tool qualification. : conference on gate dielectric integrity (GDI) : Jan 1999, San Jose, CA. (STP ; 1382)
Paper図書
ASTMc2000.<M17-06-1350>
National Diet Library
  • Subject Heading...- Reliability. Gate array circuits -- Materials. Silicon oxide films -- Testin...

Advanced gate stacks for high-mobility semiconductors hbk.

Advanced gate stacks for high-mobility semiconductors hbk.
Paper図書
A. Dimoulas ... [et al.] (eds.)Springerc2007
Other Libraries in Japan

Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Paper図書
editors, H.R. Huff ... [et al.]Materials Research Society1999
Other Libraries in Japan

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