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Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 393)

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California / Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 393)
紙図書
SPIEc1983.<ND386-39>
国立国会図書館
  • 件名Lithography, Electron beam. X-ray lithography. Ion beam lithography.

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 537)
紙図書
SPIE--the International Society for Optical Engineeringc1985.<M15-A1319>
国立国会図書館

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 471)

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 471)
紙図書
SPIE--the International Society for Optical Engineeringc1984.<M15-A4747>
国立国会図書館

Stereolithography and other RP&M technologies : from rapid prototyping to rapid tooling

Stereolithography and other RP&M technologies : from rapid prototyping to rapid tooling
紙図書
Paul F. JacobsSociety of Manufacturing Engineers in cooperation with the Rapid Prototyping Association of SMEc1996
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Rapid prototyping & manufacturing : fundamentals of stereolithography

Rapid prototyping & manufacturing : fundamentals of stereolithography
紙図書
Paul F. Jacobs, principal authorSociety of Manufacturing Engineers1992
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Rapid prototyping & manufacturing : fundamentals of stereolithography 1st ed., 3rd printing.

Rapid prototyping & manufacturing : fundamentals of stereolithography 1st ed., 3rd printing.
紙図書
Paul F. Jacobs, principal authorSociety of Manufacturing Engineers1992
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The physics of submicron lithography

The physics of submicron lithography
紙図書
Kamil A. ValievPlenum Pressc1992
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Ion tracks and microtechnology : principles and applications

Ion tracks and microtechnology : principles and applications
紙図書
Reimar Spohr ; edited by Klaus BethgeViewegc1990
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Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California pbk.
紙図書
Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working GroupSPIEc1983
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Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
紙図書
David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECHSPIEc1996
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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
紙図書
Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical EngineeringSPIEc1991
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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
紙図書
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials InternationalSPIEc1994
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Proceedings of the 36th International Symposium on Electron, Ion, and Photon Beams, 26-29 May 1992 The Peaboy Hotel, Orland, Glorida

Proceedings of the 36th International Symposium on Electron, Ion, and Photon Beams, 26-29 May 1992 The Peaboy Hotel, Orland, Glorida
紙図書
special editor for the proceedings, Randy KubenaPublished for the American Vacuum Society by the American Institute of Physics1992
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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California pbk.

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California pbk.
紙図書
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical EngineeringThe Societyc1993
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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California
紙図書
Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical EngineeringSPIEc1989
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Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California

Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California
紙図書
James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--the International Society for Optical EngineeringThe Societyc1990
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Proceedings of the 35th International Symposium on Electron, Ion, and Photon Beams, 28-31 May 1991 Seattle Sheraton Hotel & Towers, Seattle, Washington special casebound ed.

Proceedings of the 35th International Symposium on Electron, Ion, and Photon Beams, 28-31 May 1991 Seattle Sheraton Hotel & Towers, Seattle, Washington special casebound ed.
紙図書
special editor for the proceedings, Jane ShawPublished for the American Vacuum Society by the American Institute of Physics1991
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Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California

Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California
紙図書
Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical EngineeringSPIEc1992
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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California pbk.
紙図書
Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical EngineeringThe Societyc1988
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Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California pbk.

Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California pbk.
紙図書
Phillip D. Blais, chair/editor ; sponsored by SPIE--the International Society for Optical EngineeringThe Societyc1987
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