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Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 333)

Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 333)
Paper図書
International Society for Optical Engineering1982.<M15-A5689>
National Diet Library
  • Author Heading...roelectronics. Northern California Microphotomask/Masking Working Group. Materials Research Society.

Developments in semiconductor microlithography. (Proceedings of the Society of Photo-Optical Instrumentation Engineers)

Developments in semiconductor microlithography. (Proceedings of the Society of Photo-Optical Instrumentation Engineers)
Paper図書
Society of Photo-Optical Instrumentation Engineers.1976.<ND371-28>
National Diet Library
  • Author Heading...ion Engineers. Northern California Microphotomask/Masking Working Group. International Society for Hyb...

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California
Paper図書
Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working GroupS.P.I.E.-- the Society of Photo-optical Instrumentation Engineersc1979
Other Libraries in Japan

Submicron lithography pbk.

Submicron lithography pbk.
Paper図書
Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, CaliforniaInternational Society for Optical Engineering1982
Other Libraries in Japan

Semiconductor microlithography V pbk.

Semiconductor microlithography V pbk.
Paper図書
Jim Dey, editor ; presented by the Society of Photo-optical Instrumentation Engineers in cooperation with the Northern California Microphotomask/Masking Working Group and the International Society for Hybrid MicroelectronicsS.P.I.E.-- Society of Photo-optical Instrumentation Engineersc1980
Other Libraries in Japan

Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California

Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California
Paper図書
James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid MicroelectronicsSPIEc1977
Other Libraries in Japan

Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California

Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California
Paper図書
Donald E. Routh ... [et al.], editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid MicroelectronicsSociety of Photo-optical Instrumentation Engineersc1976
Other Libraries in Japan

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California pbk.

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California pbk.
Paper図書
Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working GroupSPIEc1983
Other Libraries in Japan

Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California pbk.

Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California pbk.
Paper図書
Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working GroupSPIE--the International Society for Optical Engineeringc1983
Other Libraries in Japan

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